HR Laser Mirrors
High-Reflectance Cavity & Steering Mirrors · UV Fused Silica Substrate
High-reflectance laser mirrors use multi-layer dielectric coatings on UV fused silica substrates to achieve >99.5% reflectance at the design wavelength. The low-absorption fused silica substrate minimizes thermal lensing under high average power. Available for AOI 0° (cavity end mirrors) or AOI 45° (beam steering and folding mirrors).
Specifications
| Parameter | Value |
|---|---|
| Substrate | UV Fused Silica (JGS1) |
| Diameter | Ø12.7–Ø101.6mm |
| Thickness | 3–12mm |
| Surface Quality | 10-5 S/D |
| Surface Flatness | λ/10 |
| Parallelism | < 30" |
| Reflectance | > 99.5% at design wavelength |
| Available AOI | 0° (cavity end) or 45° (steering) |
| Indicative LIDT | ≥ 5 J/cm² @ 1064nm, 10ns pulse |
Supported Wavelengths
| Wavelength | Laser Source | Notes |
|---|---|---|
| 193nm | ArF Excimer | UV fused silica substrate required |
| 266nm | Nd:YAG 4ω | UV grade fused silica substrate |
| 355nm | Nd:YAG 3ω | UV grade fused silica substrate |
| 532nm | Nd:YAG 2ω | Standard or UV substrate |
| 1030nm | Yb:YAG / Fiber | Broadband coating available |
| 1064nm | Nd:YAG | Most common; high-LIDT coating available |
Coating Details
- HR dielectric multi-layer — Ion-beam sputtering (IBS) or e-beam evaporation; R > 99.5% at design wavelength
- AR on back face — Eliminates ghost reflections; R < 0.3% at design wavelength
- Specify at order: wavelength, AOI (0° or 45°), polarization (S / P / unpolarized), peak power or pulse energy if LIDT is critical
Typical Applications
Laser Cavity End MirrorsBeam Steering & Folding MirrorsQ-Switch Laser SystemsNd:YAG / Fiber Laser ComponentsUV Excimer Laser SystemsUltrafast Laser Cavities